ISSN print edition: 0366-6352
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 Wetting of epitaxial silicium layer and pyrolytic SiO2 layer

V. Hrivnáková, Ľ. Lapčík, S. Fekete, and L. Hebort

Department of Textile, Pulp, and Paper, Slovak Technical University, CS-812 37 Bratislava


Abstract:  The process of adhesion of water and organic liquids on the surface of Si and SiO2 was studied. The values of dispersion σd(s) and polar aσp(s) components of the density of the surface Gibbs energy σ(s) of epitaxial Si layer and pyrolytic SiO2 layer were determined by the method based on measuring the angle of wetting φ. It has been found that the polar component of interaction regulates the density of the surface Gibbs energy of the above substrates.

Full paper in Portable Document Format: 386a731.pdf


Chemical Papers 38 (6) 731–738 (1984)

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